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To support the epitaxial deposition process,
GlobiTech designed and constructed a 125,000 square foot facility.
Designed to support the environmental requirements for the epitaxial
deposition process, this facility will support future product growth
expansion plans. Currently in production, Fab 1 houses an 8,000
square foot Class-1 cleanroom for 100mm through 200mm epi wafer
production. To support future capacity expansion; a structural shell for Fab 2 cleanroom, a mirror image of Fab 1, has been completed. The
cleanrooms are designed using a ballroom equipment configuration. Waffle
deck flooring is incorporated to provide uniform airflow throughout the
room.
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The facility is equipped with the following systems
to support the cleanrooms and the epitaxial process:
- True Class-1 cleanroom design with three
level construction and waffle deck on cleanroom level.
- Ultrapure DI-Water System
- Bulk process gas and chemical delivery.
- Liquid Hydrogen
- On-site Nitrogen generation with Liquid
Delivery backup.
- TCS by ISO Trailer
- HCl by Tube Trailer
- SC1/SC2 clean chemistry by drums or totes.
- Ultrapure piping installations for gas and
chemical delivery.
- Specially designed reactor exhaust abatement
and control.
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GlobiTech's factory was designed to employ the
most advanced factory management systems. Automation and CIM (Computer
Integrated Manufacturing) systems allow single wafer tracking
throughout the factory, resulting in obtaining process history of every
wafer throughout the process. Single wafer data combined with real-time
statistical process control facilitates high quality and lower cost of
ownership. GlobiTech’s CIM capabilities include:
- Process and metrology tool automation -
recipe download, state control, data collection, and slot level
wafer tracking.
- Wafer level tracking by RFID throughout the
fab.
- Automated data collection and storage in an
Oracle database.
- Real time SPC for critical production
parameters.
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