GlobiTech, Inc.



To support the epitaxial deposition process, GlobiTech operates a 125,000 square foot facility. Currently in production are two 8,000 square foot Class-1 cleanrooms (Fab 1/Fab2) for 100mm through 200mm epi wafer production. Both cleanrooms utilize ballroom equipment configuration for optimal equipment placement and product flow. Waffle deck flooring is incorporated to provide uniform airflow throughout the room.

The facility is equipped with the following systems to support the cleanrooms and the epitaxial process:

  • True Class-1 cleanroom designed specifically for the Epi process, with three-level construction & waffle deck on cleanroom level
  • Ultrapure DI-Water system
  • Bulk process gas & chemical delivery
  • Ultrapure piping installations for gas & chemical delivery
  • Specially designed reactor exhaust abatement & control
  • Temperature and humidity-controlled environment for wafer processing and storage
Gas Cabinets

GlobiTech’s factory was designed to employ the most advanced factory management systems. Automation and CIM (Computer Integrated Manufacturing) systems allow single wafer tracking throughout the factory, resulting in obtaining process history of every wafer throughout the process. Single wafer data combined with real-time statistical process control facilitates high quality and lower cost of ownership. GlobiTech’s CIM capabilities include:

Tencor Review
  • Totally integrated, computer based Manufacturing Execution Systems (MES) and Facility Management System (FMS)
  • Process and metrology tool automation—recipe download, state control, data collection, and slot level wafer tracking
  • Wafer level tracking by RFID throughout the facility
  • Automated data collection and storage
  • Real time SPC for critical production parameters